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Polyimide monomers
Photoresist materials
Lithium battery materials
OLED materials and intermediates
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PRODUCTS
Photoresist materials
Monomers
Photoresist materials
Monomers
PAC - Photosensitizers
PAG - Photoacid generators
Additives
Photoinitiators
BARCK - Bottom anti-reflective coating materials
Solvents
CAS:52858-59-0
THPMA
CAS:15895-80-4
2-Tetrahydrofuranyl methacrylate
CAS:51920-52-6
1-Ethoxyethyl methacrylate
CAS:325991-26-2
1-Methyl-1-ethyl-1-adamantylmethanol methacrylate
CAS:63600-35-1
2-Acetoxystyrene
CAS:863198-25-8
2-Propenoic acid, 2-methyl-, (tricyclo[3.3.1.13,7]dec-1-yloxy)methyl ester
CAS:186768-92-3
4-Ethenyl-1,2-bis(1-ethoxyethoxy)-benzene
CAS:214531-13-2
Tetrahydro-2-[4-(1-methylethenyl)phenoxy]furan
CAS:1004549-78-3
PBuMA
CAS:2397-76-4
NPMA
CAS:352-87-4
EFMA
CAS:100472-88-6
EBuMA
CAS:10095-20-2
2,3-dihydroxypropyl prop-2-enoate
CAS:2653-39-6
4-vinylphenyl glycidyl ether
CAS:155222-48-3
3,5-diacetoxystyrene
CAS:1092853-38-7
3-(4-Hydroxyphenoxy)propyl acrylate
CAS:325991-24-0
1,1-diethyl-1-adamantylmethanol methacrylate
CAS:314756-98-4
2-Trifluoromethanesulfonylaminoethyl methacrylate
CAS:343305-64-6
2,3-Difluoro-4-vinylphenol
CAS:646058-20-0
3-Fluoro-4-vinylphenol
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